INFRASTRUCTURE
Be Confident of Superior Efficiency with Promptness in All Aspects.
Prompt tools, technology, and facilities that comply with the international industrial standards for integrated circuit manufacturing industry, together with the expertise of our personnel that has been widely accepted, lead to the development of your excellent services and highly efficient products that enable your businesses to make a great leap.
Our superior promptness in terms of facilities is profitable for the research and development of products and services. All facilities that the center provides are:
OUR RESEARCH
Oxygen Control on Nanocrystal-AlON Films by Reactive Gas-Timing Technique R.F. Magnetron Sputtering and Annealing Eff
The AlON films grown on Si(100) substrates by using radio frequency (r.f.) magnetron sputtering from high purity aluminum (99.999% Al) target with a novel reactive gas-timing techn...