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HIGH-DIELECTRIC CONSTANT ALON PREPARED BY RF GAS-TIMING SPUTTERING FOR HIGH CAPACITANCE DENSITY

 

This paper presents the method to prepare and characterize high-dielectric constant aluminum oxynitride (AlON) formed by RF gas-timing sputtering. AlON layers of 725nm have been prepared on metal–dielectric–metal structure with substrate temperature below 100 1C. Capacitance versus bias voltage has been measured. The dielectric constant of AlON has been calculated from the slope of the plot of capacitance versus capacitor area. The value of 11 has been obtained from this study. This depends on the composition of the AlON material, which is analyzed by Auger electron spectroscopy.

 

 

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Post on 2009-06-14 | View 10686

 

 

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Oxygen Control on Nanocrystal-AlON Films by Reactive Gas-Timing Technique R.F. Magnetron Sputtering and Annealing Eff

Post on 2009-06-14

 

 

The AlON films grown on Si(100) substrates by using radio frequency (r.f.) magnetron sputtering from high purity aluminum (99.999% Al) target with a novel reactive gas-timing techn...

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