Jakrapong Supadech
Assistant Researcher
E-mail : jakrapong.supadech@nectec.or.th
Telephone : +66 38 857-100 ext. 131
Roles and Responsibilities
Plasma etch process enginee
Research Interests
Temperature sensor, MEMs, Plasma etch technique, Microelectronics.
Selected Publications
N. Atthi, K. Tantanasiriwong, A. Pankiew, W. Bunjongpru, J. Supadech, A. Srisuwan, N. Penpondee, C.Hruanun and A. Poyai, “The Microstructure Pattern Quality Investigation After Patterning and Etching Steps by Using SEM and EDX Characterization Techniques”, the 26th Annual Conference of The microscopy society of Thailand, (MST-2009), pp.139-140, THAILAND, (2009).
N. Atthi, O. Nimittrakoolchai, S. Supothina, J. Supadech, W. Jeamsaksiri, A. Pankiew, C. Hruanun, and A. Poyai, “Effect of Si micro-pattern shape on water-repellant surface properties”, The 4th International Conference on Sensors (ASIA sense 2009), THAILAND, (2009).
N. Atthi, N. Chathirat, S. Dangtip, O. Trithaveesak, J. Supadech, W. Jeamsaksiri, A. Pankiew, C. Hruanun, and A. Poyai, “Fabrication of transducer on opaque substrate by using ultra-thin transparent membrane for biosensor application”, The 4th International Conference on Sensors (ASIA sense 2009), THAILAND, (2009).
N. Atthi, J. Supadech, A Srisuwan, O.Trithaveesak, A. Pankiew, W. Jeamsaksiri, A. Pankiew, C. Hruanun, and A. Poyai, “The effects of photoresist pattern shape to deep-etched pattern quality”, The 4th International Conference on Sensors (ASIA sense 2009), THAILAND, (2009).
Post on 2009-06-11 | View 17409
OUR RESEARCH
An extreme change in structural and optical properties of indium oxynitride deposited by reactive gas-timing RF magnetro
The indium oxynitride (InON) films were achieved by reactive RF magnetron sputtering indium target which has the purity of 99.999% with a novel reactive gas-timing technique. The s...
