จักรพงศ์ ศุภเดช
ผู้ช่วยนักวิจัย
E-mail : jakrapong.supadech@nectec.or.th
Telephone : +66 38 857-100 ext. 131
Roles and Responsibilities
Plasma etch process engineer
Research Interests
ตัวตรวจวัดอุณหภูมิ, เครื่องจักรกลขนาดจุลภาค, เทคนิคการกัดด้วยพลาสมา
Selected Publications
N. Atthi, K. Tantanasiriwong, A. Pankiew, W. Bunjongpru, J. Supadech, A. Srisuwan, N. Penpondee, C.Hruanun and A. Poyai, “The Microstructure Pattern Quality Investigation After Patterning and Etching Steps by Using SEM and EDX Characterization Techniques”, the 26th Annual Conference of The microscopy society of Thailand, (MST-2009), pp.139-140, THAILAND, (2009).
N. Atthi, O. Nimittrakoolchai, S. Supothina, J. Supadech, W. Jeamsaksiri, A. Pankiew, C. Hruanun, and A. Poyai, “Effect of Si micro-pattern shape on water-repellant surface properties”, The 4th International Conference on Sensors (ASIA sense 2009), THAILAND, (2009).
N. Atthi, N. Chathirat, S. Dangtip, O. Trithaveesak, J. Supadech, W. Jeamsaksiri, A. Pankiew, C. Hruanun, and A. Poyai, “Fabrication of transducer on opaque substrate by using ultra-thin transparent membrane for biosensor application”, The 4th International Conference on Sensors (ASIA sense 2009), THAILAND, (2009).
N. Atthi, J. Supadech, A Srisuwan, O.Trithaveesak, A. Pankiew, W. Jeamsaksiri, A. Pankiew, C. Hruanun, and A. Poyai, “The effects of photoresist pattern shape to deep-etched pattern quality”, The 4th International Conference on Sensors (ASIA sense 2009), THAILAND, (2009).
Post on 2009-06-11 | View 17180
OUR RESEARCH
High-dielectric constant AlON prepared by RF gas-timing sputtering for high capacitance density
This paper presents the method to prepare and characterize high-dielectric constant aluminum oxynitride (AlON) formed by RF gas-timing sputtering. AlON layers of 725nm have been pr...
