Nithi Atthi
Assistant Researcher
E-mail : nithi.atthi@nectec.or.th
Telephone : +66-38-857100 ext. 125
Roles and Responsibilities
Photomask fabrication and Photolithography process for semiconductor manufacturing
Research Interests
Photomask fabrication and Photolithography process for semiconductor manufacturing and Micro-Electro Mechanical System (MEMS), Lithography Simulation software, 3-D microstructures patterning; Materials characterization by various microscopy techniques – Field Emission Scanning Electron Microscope (FE-SEM), Critical Dimension Scanning Electron Microscope (CD-SEM), Energy Dispersive X-ray Spectroscopy (EDS), Step profiler, Laser Particle counter, Spectrophotometer, Ellipsometer, Sheet Resistivity Measurement, UV-Spectroscopy, Image analysis; Superhydrophobic surface and water repellant; Hard Disk Drive manufacturing (Slider read/write head fabrication)
Selected Publications
W. Jeamsaksiri, W. Bunjongpru, N. Atthi, K. Uprakoat, C. Hruanun and A. Poyai, “Truly CMOS Compatible Nitride Membrane ISFET Design, Fabrication, Testing, and Market Considerations”, Laos Journal on Applied Science (ICAS-2006), LAO, pp.578-583, (2006).
J. Jantawong, N. Atthi, S. Niemcharoen, K. Siangchaew, W. Jeamsaksiri, and A. Poyai. “The study on 3-D Microstructure Fabrication with Gray-scale lithography technique”, Ladkrabang Engineeering Journal 25 (2), pp.42-46, (2007).
N. Atthi, C. Aramphongphun, P. Yanpirat, P. Charnsetthikul, and W. Jeamsaksiri, “Study of Optimization Condition for Spin Coating of the Photoresist Film on 3 Inches Wafer by Taguchi Design of Experiment”, Khon kaen University Research Journal (KKU Res J (13) 3), Vol.13, April 2008, THAILAND, pp.347-352 (2008).
N. Atthi, J. Jantawong, W. Jeamsaksiri, C. Hru-anun, and A. Poyai, “3-Dimensionals Lithography Techniques for Air Bearing Surface Patterning in Hard-Disk Drive Reading/Writing Head Manufacturing”, Khon kaen University Research Journal (KKU Res J (13) 3), Vol.13, April 2008, THAILAND, pp.353-359 (2008).
N. Atthi, “Local Photomask Fabrication Capability to Support Hard-Disk Drive Manufacturing in Thailand”, Khon kaen University Research Journal (KKU Res J (13) 3), Vol.13, April 2008, THAILAND, pp.360-364 (2008).
N. Atthi, J. Jantawong, W. Jeamsaksiri, A. Pankiew, and A. Poyai, “Improvement Bar Sitting Process Step in Air Bearing Surface Patterning By using Micropallette”, Khon kaen University Research Journal (KKU Res J (13) 3), Vol.13, April 2008, THAILAND, pp.365-370 (2008).
N. Atthi, O. Nimittrakoolchai, W. Jeamsaksiri, and S. Supothina, “Chemical resistant improvement of natural rubber and nitride gloves by coating with hydrophobic film”, Advanced Materials Research, by Trans Tech Publications Ltd, Vol. 55-57, 2008, SWITZERLAND, pp.741-744 (2008).
N. Atthi, O. Nimittrakoolchai, W. Jeamsaksiri, S. Supothina, C. Hruanun, and A. Poyai, “Study of Optimization Condition for Spin Coating of the Photoresist Film on Rectangular Substrate by Taguchi Design of an Experiment”, Songklanakarin J. Sci. Technology., Vol., 2009, THAILAND, pp. (2009).
Patent pending applications
a.N. Atthi, J. Jantawong and K. Siangchaew, “Photoresist 3D structures formation by varying dosetechnique from a single light source” Thailand patent pending (Pending no. 0701001176), March 2007.
b.N. Atthi and J. Jantawong, “Multi-Film Thickness Mask, MFT-Mask”, Thailand patent (Pending no. 0701002029), April 2007.
c.N. Atthi and J. Jantawong, “Micropallette to holding Micro-workpieces by using Photolithography process”, Thailand patent (Pending no.0801002813), June 2008.
d.N. Atthi, S. Supothina, and O. Nimittrakoolchai. “Chemical-adhesive protective gloves”, Thailand patent (Pending no. 0801003347). June 2008.
e.N. Atthi, O.Trithaveesak, C. Hruanun, and A. Poyai, “Self-Forming Microlens by Using a Deflection of That Film”, Thailand patent (Pending no.0901001917), April 2009.
Post on 2009-06-11 | View 28194
OUR RESEARCH
An extreme change in structural and optical properties of indium oxynitride deposited by reactive gas-timing RF magnetro
The indium oxynitride (InON) films were achieved by reactive RF magnetron sputtering indium target which has the purity of 99.999% with a novel reactive gas-timing technique. The s...